Studies on the residual stress of fluorine-doped SnO2 film deposited by chemical vapor deposition

► SnO phase was present in polycrystalline F-doped SnO2 film. ► All the films exhibit an (200) preferred orientation. ► The minimum residual stress was obtained when samples are heat-treated at 200 °C. ► Both intrinsic and thermal stress co-exist and affect the films' residual stress.