Nanoindentation and micro-mechanical fracture toughness of electrodeposited nanocrystalline Ni–W alloy films

Nanocrystalline nickel–tungsten alloys have great potential in the fabrication of components for microelectromechanical systems. Here the fracture toughness of Ni–12.7 at.%W alloy micro-cantilever beams was investigated. Micro-cantilevers were fabricated by UV lithography and electrodeposition and notched by focused ion beam machining. Load was applied using a nanoindenter and fracture toughness was calculated from the fracture load. Fracture toughness of the Ni–12.7 at.%W was in the range of 1.49–5.14 MPa √m. This is higher than the fracture toughness of Si (another important microelectromechanical systems material), but considerably lower than that of electrodeposited nickel and other nickel based alloys.

► Micro-scale cantilevers manufactured by electro-deposition and focused ion beam machining.
► Nanoindenter used to perform micro-scale fracture test on Ni-13at%W micro-cantilevers.
► Calculation of fracture toughness of electrodeposited Ni-13at%W thin films.
► Fracture toughness values lower than that of nanocrystalline nickel.