کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1668287 | 1008865 | 2011 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The reaction mechanism of the spray Ion Layer Gas Reaction process to deposit In2S3 thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The spray Ion Layer Gas Reaction (ILGAR) is a well-established, patented and commercial process used primarily to deposit In2S3 as buffer layers in thin film solar cells. In this paper we investigate the growth mechanism of the spray In2S3 ILGAR process by characterising the intermediate growth stages of films, following the growth mechanism with a quartz crystal microbalance and tracking the gaseous side-and-intermediate products during film growth, using a mass spectrometer. A basic growth mechanism model is then proposed based on an aerosol assisted chemical vapour deposition of an In(Ox,Cly,(OH)z) film, as the first stage process, followed by the conversion of the intermediate film using H2S gas to In2S3.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 19, 29 July 2011, Pages 6413–6419
Journal: Thin Solid Films - Volume 519, Issue 19, 29 July 2011, Pages 6413–6419
نویسندگان
Sophie Gledhill, Rebecca Allison, Nicholas Allsop, Yanpeng Fu, Elisavet Kanaki, Rodrigo Sáez-Araoz, Martha Lux-Steiner, Christian-Herbert Fischer,