کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1668287 1008865 2011 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The reaction mechanism of the spray Ion Layer Gas Reaction process to deposit In2S3 thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
The reaction mechanism of the spray Ion Layer Gas Reaction process to deposit In2S3 thin films
چکیده انگلیسی

The spray Ion Layer Gas Reaction (ILGAR) is a well-established, patented and commercial process used primarily to deposit In2S3 as buffer layers in thin film solar cells. In this paper we investigate the growth mechanism of the spray In2S3 ILGAR process by characterising the intermediate growth stages of films, following the growth mechanism with a quartz crystal microbalance and tracking the gaseous side-and-intermediate products during film growth, using a mass spectrometer. A basic growth mechanism model is then proposed based on an aerosol assisted chemical vapour deposition of an In(Ox,Cly,(OH)z) film, as the first stage process, followed by the conversion of the intermediate film using H2S gas to In2S3.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 19, 29 July 2011, Pages 6413–6419
نویسندگان
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