Effect of deposition rate and a-Si precursor or cap layer on structure and magnetic properties of iron films on silicon substrates

Ultrafast-deposition and a-Si precursor or cap layer are analyzed as possible approaches to the control upon interface intermixing and film growth process. A simple and effective design is delivered providing deposition rates up to 104 nm/s. XPS results evidence formation of Fe3Si in the layered structure Fe/a-Si/Si. Cross-section HRTEM data demonstrate enhanced intermixing at the a-Si/Fe film interface. Magnetic properties of the Fe–Si structures grown by the above methods are studied by in situ magneto-optic Kerr effect. Intermixing at the Fe/Si interface is the result of chemical reaction rather than diffusion.