کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1669352 1008882 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Modeling of relaxation of viscoelastic stresses in multi-layered thin films/substrate systems due to thermal mismatch
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Modeling of relaxation of viscoelastic stresses in multi-layered thin films/substrate systems due to thermal mismatch
چکیده انگلیسی

Assume the ratio of the total axial rigidity of thin films to that of the substrate is smaller than 0.02, an approximate closed-form solution for viscoelastic stresses in multi-layered thin films/substrate systems due to thermal mismatch is derived. This is achieved by utilizing the analogy between the governing field equation of elasticity and the Laplace transform with respect to time of the viscoelastic field equation. Based on two solutions, simplified solutions for relaxation of residual stresses distributed in multiple layers of thin films deposited on a thick substrate are obtained. The effect of the thickness, thermal expansion coefficient, Young's modulus, and viscosity coefficient of the substrate and thin films on the relaxation of residual stresses is considered. This simplified solution can be applied to some special cases such as one layered or periodic multi-layered thin films on a thick substrate.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 24, 1 October 2010, Pages 7497–7500
نویسندگان
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