کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1670359 | 1008899 | 2010 | 5 صفحه PDF | دانلود رایگان |

Epitaxial chromium dioxide (CrO2) thin films have been deposited by low pressure chemical vapor deposition (LPCVD) on (100) TiO2 substrates using the precursor chromium hexacarbonyl (Cr(CO)6) within a narrow temperature window of 380–400 °C. Normal θ–2θ Bragg x-ray diffraction results show that the predominant phase is CrO2 with only a small amount of Cr2O3 present, mostly at the film surface. The LPCVD films have a reasonably smooth surface morphology with a root mean square roughness of 4 nm on a scale of 5 μm. Raman spectroscopy confirms the existence of rutile CrO2 in the deposited films, while transmission electron microscopy confirms the single-crystalline nature of the films. The LPCVD films showing a dominant CrO2 phase exhibit clear uniaxial magnetic anisotropy with the easy axis oriented along the c direction.
Journal: Thin Solid Films - Volume 518, Issue 23, 30 September 2010, Pages 6853–6857