Microporous textured titanium dioxide films deposited at atmospheric pressure using dielectric barrier discharge assisted chemical vapor deposition

Titanium dioxide films are prepared by dielectric barrier discharge assisted chemical vapor deposition, under a wide range of working pressures from 200 Pa to atmospheric pressure. Measurements of scanning electron microscopy and X-ray diffraction are performed to investigate the microstructure of the thin films. As the titanium dioxide film is deposited under atmospheric pressure, a microporous textured surface film is identified, which might be attributed to the preferred orientation of film growth induced by the localized filamentary discharge. By comparison, the microporous textured titanium dioxide films deposited at atmospheric pressure show two times higher photocatalytic activity than those deposited under low pressures, whereas both of their hydrophilic activities are almost the same.