کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1672581 1008936 2008 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The international VAMAS project on X-ray reflectivity measurements for evaluation of thin films and multilayers - Preliminary results from the second round-robin
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
The international VAMAS project on X-ray reflectivity measurements for evaluation of thin films and multilayers - Preliminary results from the second round-robin
چکیده انگلیسی
X-ray reflectometry (XRR) is a unique technique for thin film analysis providing information on thickness, density, and roughness. The Versailles Project on Advanced Materials and Standards (VAMAS) project “X-ray reflectivity measurements for evaluation of thin films and multilayers” has the goal to assess the accuracy and precision of thickness, density and roughness as determined by XRR measurements and simulations. Here we present preliminary results from the second round-robin analysis on a TaN/Ta metallization on a silicon substrate. This work demonstrated a good inter-laboratory reproducibility for the tantalum film thickness with a standard deviation of 0.04 nm corresponding to about 0.3%. The use of the auto-correlation function (extracted from the derivative of density profiles obtained via a Fourier transform) was found to provide useful layer thickness measurements from important samples that are too complex for a simple direct simulation and fitting approach.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 22, 30 September 2008, Pages 7962-7966
نویسندگان
, , , , , , , , , , , ,