کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1674236 | 1008960 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of oblique-angle deposition on early stage of Fe–Si growth
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effect of oblique-angle deposition on early stage of Fe–Si growth Effect of oblique-angle deposition on early stage of Fe–Si growth](/preview/png/1674236.png)
چکیده انگلیسی
We have investigated the initial stage of Fe growth on an Si substrate during reactive oblique-angle deposition (ROAD) at 470 °C by means of atomic force microscopy, reflection high-energy electron diffraction, and high-resolution Rutherford backscattering spectroscopy. During deposition along the normal direction, many Si atoms are displaced from their lattice positions because of reactions with the deposited Fe. However, for ROAD, the number of displaced Si atoms decreases significantly along with a selective growth of nanoislands with diameters of a few 10 nm. Evidently, the local nucleation processes required for iron silicide formation are modified by the geometrical deposition conditions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 22, 15 August 2007, Pages 8277–8280
Journal: Thin Solid Films - Volume 515, Issue 22, 15 August 2007, Pages 8277–8280
نویسندگان
Hidehiko Harada, Shinji Jomori, Motofumi Suzuki, Kohei Kinoshita, Kaoru Nakajima, Kenji Kimura,