کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1674237 | 1008960 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Subsurface structures in initial stage of FeSi2 growth studied by high-resolution Rutherford backscattering spectroscopy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Subsurface structures in initial stage of FeSi2 growth studied by high-resolution Rutherford backscattering spectroscopy Subsurface structures in initial stage of FeSi2 growth studied by high-resolution Rutherford backscattering spectroscopy](/preview/png/1674237.png)
چکیده انگلیسی
The initial stage of iron silicide formation is investigated by high-resolution Rutherford backscattering spectroscopy. During the Fe deposition on Si(001) at 470 °C, the formation of FeSi2 is confirmed by the surface peak analysis. Initially, FeSi2 grows epitaxially so that one of the major crystallographic axes is parallel to the <111> axis of the Si substrate. With increasing Fe deposition, the deviation between the major crystallographic axis of the silicide region and Si<111> increases although the electron diffraction pattern is independent of the amount of Fe deposition. Therefore, the subsurface crystallographic structure of iron silicide is transformed from a cubic-like to a low-symmetry structure.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 22, 15 August 2007, Pages 8281–8284
Journal: Thin Solid Films - Volume 515, Issue 22, 15 August 2007, Pages 8281–8284
نویسندگان
Motofumi Suzuki, Kohei Kinoshita, Shinji Jomori, Hidehiko Harada, Kaoru Nakajima, Kenji Kimura,