Growth of thin Ag films produced by radio frequency magnetron sputtering

Thin Ag films in the thickness range D = 14–320 nm were deposited by radio frequency magnetron sputtering on glass substrates at room temperature inside a vacuum chamber with base pressure of about 5 × 10− 6 Pa. The growth of the films was studied via X-ray diffraction and atomic force microscopy experiments. The two techniques are complementary and give us the opportunity to study the surface roughness, the statistical distribution and the average value of the grain size, as well as the texture of the samples. It is shown that the film roughness increases negligibly within the first 60 atomic layers of growth. The thicker films (D ∼300 nm) develop a nanocrystalline structure with a root mean square roughness of about 2.5 nm. The grain size evolves linearly with the thickness from 9.4 nm at D = 54 nm to 31.6 nm at D = 320 nm.