Plasma CVD on the inner surface of a microchannel

A low-pressure dielectric barrier discharge plasma has been generated in a micro capillary and in a microchannel fabricated in a Pyrex chip. Plasma chemical vapor deposition (P-CVD) of platinum films by the micro capillary plasma can be done successfully by using platinum bisacetylacetonate (Pt(C5H7O2)2) as a precursor. Uniform deposition between electrodes can be achieved by controlling the voltage and frequency. With proper voltage control, deposition increases between electrodes as frequency increases. These experiments show that the P-CVD technique can be useful to make films inside a microchannel.