کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5465973 | 1517977 | 2017 | 26 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Indium tin oxide sputtering damage to catalytic chemical vapor deposited amorphous silicon passivation films and its recovery
ترجمه فارسی عنوان
آسیب ناشی از اکسید قلع اتیوم به بخار شیمیایی کاتالیزوری، فیلم های غیر انعقادی سیلیکون غوطه ور شده و بازیابی آن
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
We investigated the influence of indium tin oxide (ITO) sputtering damage to various types of amorphous silicon (a-Si) passivation films deposited by catalytic chemical vapor deposition. Intrinsic (i-) a-Si, n-type (n-) a-Si/i-a-Si, and p-type (p-) a-Si/i-a-Si stacked films were prepared on crystalline Si, and ITO was sputtered at various temperatures and RF powers, followed by post-annealing at 200 °C. Effective minority carrier lifetime (Ïeff) of almost all the samples decreases drastically after sputtering, while Ïeff of the samples with ITO sputtered at room temperature recovers significantly by post-annealing. Annealing before sputtering and sputtering at lower RF power leads to more effective recovery of Ïeff. The samples with ITO sputtered to an n-a-Si/i-a-Si stack show large Ïeff recovery, while the samples with ITO sputtered to a p-a-Si/i-a-Si stack show much smaller Ïeff recovery. Ïeff recovery after ITO sputtering thus depends on the types of a-Si passivation films, which may be related to the modification of band alignment by the existence of ITO.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 635, 1 August 2017, Pages 73-77
Journal: Thin Solid Films - Volume 635, 1 August 2017, Pages 73-77
نویسندگان
Takeo Konishi, Keisuke Ohdaira,