کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812691 | 1518117 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Characterizations of CNx thin films made by ionized physical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Characterizations of CNx thin films made by ionized physical vapor deposition Characterizations of CNx thin films made by ionized physical vapor deposition](/preview/png/9812691.png)
چکیده انگلیسی
Thin films of CNx deposited by physical vapor deposition (PVD) with different contents of nitrogen have been studied. An RF-powered antenna was added to a classical magnetron sputtering system. The addition of an antenna plays an important role in mechanical and physicochemical properties. The films have been characterized using XPS, AFM, Brillouin light scattering, grazing angle FTIR, and wettability test. The results show in particular that the Rayleigh wave velocity determined by BLS increased when deposit is assisted by the antenna. Refractive index and surface tension are also enhanced with the use of an antenna. Moreover, high deposition rates are obtain with antenna without modification of N/C ratio.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 482, Issues 1â2, 22 June 2005, Pages 192-196
Journal: Thin Solid Films - Volume 482, Issues 1â2, 22 June 2005, Pages 192-196
نویسندگان
F. Tétard, P. Djemia, M.P. Besland, P.Y. Tessier, B. Angleraud,