Comparative study of chromium nitride coatings deposited by unbalanced and balanced magnetron sputtering

The rf bias voltage primarily influenced the crystal orientation and hardness of the deposits. Films deposited without bias presented about 80% of (200) orientation and 20% (111), whereas at rf biasing the orientation was preferentially (200). The hardness values on stainless steel substrates varied from 1200 to 1600 Hv0.01, and cross-section SEM images showed that the CrN films had a dense microstructure where columnar growth was inhibited. The relationship between growth conditions, microstructure and plasma parameters is presented and discussed.