کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9813083 | 1518125 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structure of a thin barrier film deposited from tetrakis-(dimethylamino)-titanium onto a Si(100)-2Ã1 substrate
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The formation and structure of a thin film deposited using tetrakis-(dimethylamino)-titanium [Ti(N(CH3)2)4, TDMAT] as a precursor onto a Si(100)-2Ã1 substrate at ultrahigh vacuum (UHV) conditions was investigated by a combination of surface analytical techniques. The effects of surface temperature and pressure of the precursor molecules on the deposition rate are correlated with the monolayer chemistry of the precursor. The titanium carbonitride (TiCxNy) thin films produced by thermal deposition of TDMAT onto Si(100)-2Ã1 at 593 K are continuous and smooth with a root-mean-square (RMS) roughness of <2 nm, having a thickness with a lower limit of 4.7±0.4 nm, and a stoichiometry of approximately x=y=1. In addition, it was determined that the lower limit of the sputtering rate for TiCxNy was â¼0.016 nm sâ1 under the conditions used here. These films hold great promise as barrier materials in next-generation microelectronic devices.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 471, Issues 1â2, 3 January 2005, Pages 159-165
Journal: Thin Solid Films - Volume 471, Issues 1â2, 3 January 2005, Pages 159-165
نویسندگان
Semyon Bocharov, Zhanping Zhang, Thomas P. Jr., Andrew V. Teplyakov,