
Optimizing the growth of CoSi2 film with oxide-mediated CoSi2 template by silicon cap layer
Keywords: A1 پراش اشعه ایکس; 68.35.Ct; 81.15.Hi; 66.30.Ny; 61.10.Kw; A1. Characterization; A1. X-ray diffraction; A3. Solid phase epitaxy; B2. Semiconducting materials;