Temperature dependent electrical impedance spectroscopy measurements of plasma enhanced chemical vapour deposited linalyl acetate thin films

Electrical impedance spectroscopy measurements were performed on metal–insulator–metal structures using recently developed plasma deposited thin films of linalyl acetate as the insulating layer between frequencies of 10 Hz and 100 kHz in order to better understand this material's dielectric and structural properties. Furthermore, measurements were performed on samples fabricated under various input energy conditions to determine whether effects induced by these conditions influence the dielectric properties. The plasma deposited linalyl acetate thin films were found to be low dielectric constant across a wide range of frequencies, with primary contributions from electronic factors. Neither α- nor β-relaxation peaks were observed in the frequency range investigated at room temperature and no significant dependence of dielectric properties on input energy was observed. Samples were then investigated under heated conditions at four temperatures, where a single relaxation peak was found. This peak was quite broad, indicative of the contribution of multiple relaxations to the dielectric response. The distribution of these relaxation times was determined through regularisation methods. The breakdown field was investigated for samples at three thicknesses, and found to be approximately 1.8 MV/cm.

► Impedance spectroscopy of plasma deposited linalyl acetate thin films performed
► Dielectric constant decreases with RF power.
► Low dielectric constant/low loss
► AC conductivity does not contribute to loss.
► Single relaxation feature, described by relaxation time distribution