Nanoporous films obtained by sacrificial layer pulsed laser deposition

Integration of solid state gas sensors and solid oxide fuel cells into third generation microelectronic products requires the development of unique fabrication methods. Highly porous electrodes, critical to the performance of many gas dependent devices, typically require harsh production methods and high sintering temperatures that are incompatible with a variety of platforms including those based on silicon or glass. In this study, an alternative procedure for overcoming these problems has been developed. It is based on the synthesis of nano-porous films at reduced fabrication temperatures by means of the Sacrificial Layer Pulsed Laser Deposition (SL-PLD). SL-PLD utilizes simultaneous oxide and carbon deposition to deposit thin dense films. These amorphous films are then transformed into nano-porous perovskite films by thermal annealing in ambient air at 600 ºC. In this paper, an alternative process for the development of nano-porous thin films at reduced fabrication temperatures is presented. It takes advantage of the low temperatures needed for both carbon burn-off and the structural transformation of many perovskite oxides. This alternative method for thin film fabrication opens the possibility for low temperature fabrication of porous ceramic materials.