Microstructural characteristic of vapor-phase sputter co-deposited Al–Ge nanocomposite thin films

A series of Al–Ge thin films, with varying overall compositions, were codeposited in a radio frequency inductively coupled plasma assisted hybrid chemical/physical vapor deposition system. Detailed compositional and structural characterization of sputter co-deposited Al–Ge thin films was carried out using X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, scanning electron microscopy, and transmission electron microscopy (TEM). Ge crystallization and Al–Ge phase separation in as-deposited Al–Ge thin films were studied by high-resolution TEM. The present study reveals some details regarding the process of Al–Ge phase separation during thin film deposition.