کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1672634 | 1008937 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Plasma polymerization of fluorocarbon thin films on high temperature substrate and its application to low-k films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Plasma polymerization of fluorocarbon thin films on high temperature substrate and its application to low-k films Plasma polymerization of fluorocarbon thin films on high temperature substrate and its application to low-k films](/preview/png/1672634.png)
چکیده انگلیسی
Amorphous fluorinated carbon films have been prepared by plasma enhanced chemical vapor deposition method using C6F6 at substrate temperature of 400 °C. Thermal stability up to 400 °C is automatically achieved. Dielectric constant of the films is 2. Infrared absorption spectra of the films have indicated that the films contain benzene rings, and F/C ratio is unity as seen in monomer molecules. No film deposition has been observed if C5F8 is used as a source monomer at this substrate temperature. In situ Fourier transform infrared spectroscopy of C6F6 plasma has indicated production of C6F5 because C12F10 has been observed. This result and inclusion of benzene rings in the films suggest that a possible deposition precursor is C6F5.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 9, 12 March 2007, Pages 4111–4115
Journal: Thin Solid Films - Volume 515, Issue 9, 12 March 2007, Pages 4111–4115
نویسندگان
Tatsuru Shirafuji, Yoshiyasu Nishimura, Kunihide Tachibana,