کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5465898 | 1517974 | 2017 | 47 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Characterization of IrOx sputtering for IrO2 and IrO2/Pt bottom-electrode piezoelectric micro-electro-mechanical systems applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
This study examines the effects of sputter deposition growth conditions on IrO2 thin films developed as electrode layers for Pb(ZrxTi1-x)O3 piezoelectric Micro-Electro-Mechanical Systems applications. For IrO2 thin-film bottom electrodes sputter deposited on {100}-textured, rutile structure, TiO2 template layers, the effects of substrate temperature, Ar and O2 flow rates, and post-deposition anneal were studied. Additionally, the impact of various IrO2/Pt bilayer structures on electrode properties were investigated. IrO2 bottom electrodes grown on 100-oriented TiO2 at 500 °C with an Ar flow rate of 100 sccm, O2 flow rate of 60 sccm, and a nominal 100 nm thickness exhibited a film sheet resistance of 9.2 ± 0.2 Ω/sq., surface roughness of 2.3 ± 0.1 nm measured over a 2 μm Ã 2 μm area, and a rutile structure, preferred-{100} crystalline fiber texture normal to the substrate plane. Furnace-anneal treatments on this electrode at 650 °C for 30 min in 3 SLM O2 improved its sheet resistance to 7.5 ± 0.2 Ω/sq., and surface roughness was 4.0 ± 0.1 nm. Bilayers of IrO2/Pt grown on TiO2, with IrO2 and Pt thicknesses in the 0-100 nm range, were sputter deposited at 500 °C. The electrodes had composite sheet resistances in the range of 1.34 ± 0.03 Ω/sq. to 9.92 ± 0.25 Ω/sq., and surface roughnesses ranging from 1.5 ± 0.1 nm to 2.0 ± 0.1 nm for 2 μm Ã 2 μm measurement areas. Scanning Transmission Electron Microscopy verified preferred IrO2 and Pt crystalline fiber textures of {100} and {111}, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 638, 30 September 2017, Pages 127-137
Journal: Thin Solid Films - Volume 638, 30 September 2017, Pages 127-137
نویسندگان
Daniel M. Potrepka, Manuel Rivas, Haibo Yu, Ronald G. Polcawich, Mark Aindow, Glen R. Fox,