Modifications of reactively sputtered titanium nitride films by argon and vanadium ion implantation: Microstructural and opto-electric properties

► Distinguishing between chemical and purely defect-related implantation effects ► Layer geometry and microstructure of the deposited and ion-irradiated layers ► Variation of the electric and optical resistivity as function of ion fluence and type ► Opto-electric properties in terms of plasma energy and electron relaxation time