کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812896 | 1518122 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of a-C:F films as hydrogenated diamond-like carbon and low-k materials
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Fluorinated amorphous carbon films were deposited on a p-type silicon substrate by using an inductively coupled plasma chemical vapor deposition with mixture of carbon tetrafluoride and methane gases. The structural properties of fluorinated amorphous carbon films as a diamond-like carbon were studied by Raman spectra, Fourier transform infrared spectra (FTIR) and X-ray photoelectron spectroscopy (XPS) spectra as a function of the flow rate ratio of precursors. The variation of the fluorine contents of fluorinated amorphous carbon films was investigated by X-ray photoelectron spectroscopy. From these chemical results, the correlation between the dielectric constant and the variation of the bonding structure as a function of the flow rate ratio was researched.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 109-112
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 109-112
نویسندگان
Teresa Oh, Chi Kyu Choi, Kwang-Man Lee,