Evidence and modelling current dependence of defect generation probability and its impact on charge to breakdown Fulltext Access 4 Pages 2005
Improvement of the P/E window in nanocrystal memories by the use of high-k materials in the control dielectric Fulltext Access 4 Pages 2005
Comparison of interfaces states density through their energy distribution and LVSILC induced by uniform and localized injections in 2.3Â nm thick oxides Fulltext Access 4 Pages 2005
Experimental investigation of the dielectric-semiconductor interface with scanning capacitance microscopy Fulltext Access 4 Pages 2005
Experimental extraction of degradation parameters after constant voltage stress and substrate hot electron injection on ultrathin oxides Fulltext Access 4 Pages 2005
Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing Fulltext Access 4 Pages 2005
In situ steam generation (ISSG) versus standard steam technology: impact on oxide reliability Fulltext Access 4 Pages 2005
Optimization of low temperature silicon nitride processes for improvement of device performance Fulltext Access 4 Pages 2005
Influence of oxide breakdown position and device aspect ratio on MOSFET's output characteristics Fulltext Access 4 Pages 2005
Conduction band states of transition metal (TM) high-k gate dielectrics as determined from X-ray absorption spectra Fulltext Access 4 Pages 2005
Admittance spectroscopy of traps at the interfaces of (1Â 0Â 0)Si with Al2O3, ZrO2, and HfO2 Fulltext Access 4 Pages 2005
Electrical properties of hafnium silicate films obtained from a single-source MOCVD precursor Fulltext Access 4 Pages 2005
On the data interpretation of the C-AFM measurements in the characterization of thin insulating layers Fulltext Access 4 Pages 2005
Breakdown spots of ultra-thin (EOTÂ <Â 1.5Â nm) HfO2/SiO2 stacks observed with enhanced-CAFM Fulltext Access 4 Pages 2005
Impact of nitrogen incorporation on interface states in (1Â 0Â 0)Si/HfO2 Fulltext Access 4 Pages 2005
Observation and characterization of defects in HfO2 high-K gate dielectric layers Fulltext Access 4 Pages 2005
Modelling mobility degradation due to remote Coulomb scattering from dielectric charges and its impact on MOS device performance Fulltext Access 4 Pages 2005
Process integration and nanometer-scale electrical characterization of crystalline high-k gate dielectrics Fulltext Access 4 Pages 2005
Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey Fulltext Access 4 Pages 2005
Performance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors Fulltext Access 4 Pages 2005
A function-fit model for the hard breakdown I-V characteristics of ultra-thin oxides in MOS structures Fulltext Access 4 Pages 2005
The effect of electrode material on the electrical conduction of metal-Pb(Zr0.53Ti0.47)O3-metal thin film capacitors Fulltext Access 4 Pages 2005
Characterization of various insulators for possible use as low-k dielectrics deposited at temperatures below 200 °C Fulltext Access 4 Pages 2005
Influence of the annealing temperature on the IR properties of SiO2 films grown from SiH4Â +Â O2 Fulltext Access 4 Pages 2005
On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD Fulltext Access 4 Pages 2005
Electrical conduction mechanism in high-dielectric-constant ZrO2 thin films Fulltext Access 4 Pages 2005
Optical and electrical characterization of hafnium oxide deposited by MOCVD Fulltext Access 4 Pages 2005
Electrical properties of metal-HfO2-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO2 gate dielectric Fulltext Access 4 Pages 2005
Electrical properties of highly reliable 32Â Mb FRAM with advanced capacitor technology Fulltext Access 4 Pages 2005
Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition Fulltext Access 4 Pages 2005
Examination and evaluation of La2O3 as gate dielectric for sub-100Â nm CMOS and DRAM technology Fulltext Access 4 Pages 2005
Electrical properties of MIS capacitor using low temperature electron beam gun-evaporated HfAlO dielectrics Fulltext Access 4 Pages 2005
Electrical characterization of HfO2 films obtained by UV assisted injection MOCVD Fulltext Access 4 Pages 2005
Electrical properties in low temperature range (5Â K-300Â K) of Tantalum Oxide dielectric MIM capacitors Fulltext Access 4 Pages 2005
Dynamic Fowler-Nordheim injection in EEPROM tunnel oxides at realistic time scales Fulltext Access 4 Pages 2005
Charge storage peculiarities in poly-Si-SiO2-Si memory devices with Si nanocrystals rich SiO2 Fulltext Access 4 Pages 2005
Nitrogen incorporated diamond-like carbon films by microwave surface wave plasma CVD Fulltext Access 4 Pages 2005
The impact of static and dynamic degradation on SOI “smart-cut” floating body MOSFETs Fulltext Access 4 Pages 2005
Passivation effects of deuterium exposure on boron-doped CVD homoepitaxial diamond Fulltext Access 4 Pages 2005
Structural change in diamond by hydrogen plasma treatment at room temperature Fulltext Access 4 Pages 2005
Synthesis of HPHT diamond containing high concentrations of nitrogen impurities using NaN3 as dopant in metal-carbon system Fulltext Access 4 Pages 2005
Change in cathodoluminescence spectra and images of type II high-pressure synthetic diamond produced with high pressure and temperature treatment Fulltext Access 4 Pages 2005
Shock compressibility and shock-induced phase transitions of C60 fullerite Fulltext Access 4 Pages 2005
High pressure–high temperature growth of diamond crystals using split sphere apparatus Fulltext Access 4 Pages 2005
Fabrication of high surface area graphitic nanoflakes on carbon nanotubes templates Fulltext Access 4 Pages 2005
Development of triode type RF plasma enhanced CVD equipment for low temperature growth of carbon nanotube Fulltext Access 4 Pages 2005
Pre- and post-BD electrical conduction of stressed HfO2/SiO2 MOS gate stacks observed at the nanoscale Fulltext Access 4 Pages 2005
Influence of technological conditions on mechanical stresses inside diamond-like carbon films Fulltext Access 4 Pages 2005
Characterization of amorphous carbon films deposited by surface wave plasma CVD Fulltext Access 4 Pages 2005
Synthesis of nitrogen incorporated diamond-like carbon thin films using microwave surface-wave plasma CVD Fulltext Access 4 Pages 2005
The interrelation between structure and mechanical properties of CNx (0 ≤ x ≤ 0.5) coatings obtained by graphite arc sputtering Fulltext Access 4 Pages 2005
Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films Fulltext Access 4 Pages 2005
Modeling and numerical analyses of microwave plasmas for optimizations of a reactor design and its operating conditions Fulltext Access 4 Pages 2005
Preparation of composite electrochemical nickel–diamond and iron–diamond coatings in the presence of detonation synthesis nanodiamonds Fulltext Access 4 Pages 2005
Deposition of diamond film on silicon and quartz substrates located near DC plasma Fulltext Access 4 Pages 2005
Thermal and electrostatic reliability characterization in RF MEMS switches Fulltext Access 4 Pages 2005
Investigation of charging mechanisms in metal-insulator-metal structures Fulltext Access 4 Pages 2005
Specification and use of pulsed current profiles for ultracapacitors power cycling Fulltext Access 4 Pages 2005
A novel fast and versatile temperature measurement system for LDMOS transistors Fulltext Access 4 Pages 2005
Non-destructive Testing Technique for MOSFET's Characterisation during Soft-Switching ZVS Operations Fulltext Access 4 Pages 2005
Trench insulated gate bipolar transistors submitted to high temperature bias stress Fulltext Access 4 Pages 2005
Reliability Potential Of Epoxy Based Encapsulants For Automotive Applications Fulltext Access 4 Pages 2005
A simple moisture diffusion model for the prediction of optimal baking schedules for plastic SMD packages Fulltext Access 4 Pages 2005
Performances and limitations analyses of PHEMT and MHEMT for applications in high bit rate fiber-optic systems Fulltext Access 4 Pages 2005
Synthesizing single-crystal diamond by repetition of high rate homoepitaxial growth by microwave plasma CVD Fulltext Access 4 Pages 2005
Non-destructive identification of open circuit in wiring on organic substrate with high wiring density covered with solder resist Fulltext Access 4 Pages 2005
Intermittent contact scanning capacitance microscopy-An improved method for 2D doping profiling Fulltext Access 4 Pages 2005
Characterisation of dopants distribution using electron holography and FIB-based lift-off preparation Fulltext Access 4 Pages 2005
Localization of Marginal Circuits for Yield Diagnostics Utilizing a Dynamic Laser Stimulation Probing System Fulltext Access 4 Pages 2005
Characterization of a 0.13 μm CMOS Link Chip using Time Resolved Emission (TRE) Fulltext Access 4 Pages 2005
Reliability improvement by the suppression of keyhole generation in W-plug vias Fulltext Access 4 Pages 2005
A Dedicated TLP Set-Up to Investigate the ESD Robustness of RF Elements and Circuits Fulltext Access 4 Pages 2005
Stress Mechanism about Field Lightning Surge of High Voltage BJT Based Line Driver for ADSL System Fulltext Access 4 Pages 2005
Elimination of surface state induced edge transistors in high voltage NMOSFETs for flash memory devices Fulltext Access 4 Pages 2005