Ultrathin EOT high-κ/metal gate devices for future technologies: Challenges, achievements and perspectives (invited)
Keywords: رسوب لایه اتمی; High-κ; Hafnium oxide; Atomic layer deposition; ALD; Physical vapor deposition; PVD; TiN; TaN; Electron mobility; MOSFETs; FinFETs; Bulk-FinFETs; Ultrathin EOT