Keywords: اما; NiSi; Nanowires; Solid-phase diffusion control; FESEM; Supercapacitor;
مقالات ISI اما (ترجمه نشده)
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Keywords: اما; NiSi; Optical recording; Write-once blu-ray disc; Activation energy; Transmission electron microscope;
Effective Schottky barrier lowering of Ni silicide/p-Si(100) using an ytterbium confinement structure for high performance n-type MOSFETs
Keywords: اما; Schottky barrier; nMOSFET; NiSi; Yb confinement;
Growth of high density NiSi/SiC core-shell nanowires by hot-wire chemical vapour deposition for electrochemical applications
Keywords: اما; HWCVD; NiSi; SiC; Core-shell; Electrochemical;
Structural and electrical characterization of platinum (~15 at%) doped nickel silicides on Si(100) and SiGe/Si(100) substrates
Keywords: اما; NiSi; NiSiGe; XRD; Phase formation; Sheet resistance
Metallic nickel silicides: Experiments and theory for NiSi and first principles calculations for other phases
Keywords: اما; Silicide; Transport properties; Magnetism; First Principles Calculations; Neutron Scattering; NiSi;
Effects of substrate temperature on the growth, structural and optical properties of NiSi/SiC core-shell nanowires
Keywords: اما; Core-shell nanowires; NiSi; SiC; Photoluminescence; HWCVD;
Effects of carbon pre-silicidation implant into Si substrate on NiSi
Keywords: اما; Carbon implant; Thermal stability; NiSi
The NiSi melting curve to 70Â GPa
Keywords: اما; NiSi; Melting; High-pressure; In situ; LH-DAC;
Texture characterization of the NiSi film on Si substrate
Keywords: اما; Axiotaxy; Crystallographic orientation; NiSi; Pole figure; Thermal stability; Transrotational structure; XRD
High-density NiSi nanocrystals embedded in Al2O3/SiO2 double-barrier for robust retention of nonvolatile memory
Keywords: اما; Nanocrystal memory; NiSi; Al2O3/SiO2 double-barrier; Vapor–solid–solid growth
20 nm Gate length Schottky MOSFETs with ultra-thin NiSi/epitaxial NiSi2 source/drain
Keywords: اما; Schottky-MOSFET; High-k; Scaling; NiSi; Epitaxial NiSi2; Short channel effects; Silicide source/drain; Implantation into silicide; Dopant segregation
Structural and magnetic properties of Ni–Pt nanoalloys supported on silica
Keywords: اما; Nanoparticles; Ni3Pt; NiPt3; NiSi; Radiolysis; Magnetization
The influence of dopant species on thermal stability of NiSi film
Keywords: اما; NiSi; Transrotational structure; TED; Thermal stability; XRD
Nanostructured NiSi thin films as a new anode material for lithium ion batteries
Keywords: اما; NiSi; Lithium ion batteries; Pulsed laser deposition; Thin film; Anode
Gate shadowing effect on Ni(Pt)Si abnormal diffusion for sub-45 nm technologies
Keywords: اما; Encroachment; NiSi; Silicide; Pt
Enhanced formation of periodic arrays of low-resistivity NiSi nanocontacts on (0Â 0Â 1)Si0.7Ge0.3 by nanosphere lithography with a thin interposing Si layer
Keywords: اما; Nanosphere lithography; NiSi; Nanocontacts; Si interlayer; SiGe; SiOx nanowires;
Kleppa type calorimeter for the study of high temperature processes
Keywords: اما; Microcalorimeter; Enthalpy of formation; Direct synthesis calorimetry; Thermochemistry; NiSi; Ni3Al
Nickel silicide encroachment formation and characterization
Keywords: اما; Nickel; Platinum; Silicide; Mono-silicide; NiSi; NiSi2; Encroachment
Oxygen distribution in nickel silicide films analyzed by time-of-flight secondary ion mass spectrometry
Keywords: اما; NiSi; Nickel silicide; LSI; Time-of-flight secondary ion mass spectrometry; TOF-SIMS; Oxygen distribution;
Formation and characterization of hybrid nanodot stack structure for floating gate application
Keywords: اما; Quantum dots; Nanodots; Silicide; NiSi; Si; Hybrid structure; Floating gate; MOS memory
In situ X-ray diffraction study of thin film Ir/Si solid state reactions
Keywords: اما; Ir; Si; NiSi; XRD
Small-signal analysis of high-performance p- and n-type SOI SB-MOSFETs with dopant segregation
Keywords: اما; Schottky barrier; MOSFET; Metal source/drain; NiSi; Silicidation; Dopant segregation; Radio frequency (RF); Scattering parameters; Small-signal analysis
Systematic study of Schottky barrier MOSFETs with dopant segregation on thin-body SOI
Keywords: اما; Schottky barrier MOSFET; Metal source/drain; NiSi; Silicidation; Dopant segregation; Source/drain resistance
X-ray photoelectron spectroscopy study of NiSi formation on shallow junctions
Keywords: اما; 85.40.Ls; 82.80.Pv; 79.20.Rf; 68.35.Dv; NiSi; XPS; Dopant segregation; Preferred sputtering;
Atomic-scale redistribution of Pt during reactive diffusion in Ni (5% Pt)–Si contacts
Keywords: اما; Laser atom probe tomography; Microelectronics; Silicides; NiSi
Controlling nickel silicide phase formation by Si implantation damage
Keywords: اما; 66.30.−h; 68.55.−a; 64.60.−iNickel monosilicide; NiSi; Ion implantation
Electroless deposition of NiWB alloy on p-type Si(1 0 0) for NiSi contact metallization
Keywords: اما; NiWB; Electroless plating; APTS; NiSi; SAM
Dopant effects on the thermal stability of FUSI NiSi
Keywords: اما; FUSI; NiSi; Work function; CMOS; Metal gate; Thermal stability;
Silicides and germanides for nano-CMOS applications
Keywords: اما; Silicide; Germanide; CMOS; NiSi; NiGe;
NiSi contact metallization using electroless Ni deposition on Pd-activated self-assembled monolayer (SAM) on p-type Si(1 0 0)
Keywords: اما; NiSi; Electroless; Self Assembled Monolayer
Effect of a thin W, Pt, Mo, and Zr interlayer on the thermal stability and electrical characteristics of NiSi
Keywords: اما; NiSi; XRD (X-ray diffraction); Raman spectral analysis; RBS (Rutherford backscattering spectrometry); SBD (Schottky barrier diode)
Addressing materials and integration issues for NiSi silicide contact metallization in nano-scale CMOS devices
Keywords: اما; NiSi; Films; Impurities; Contact metallization
Physical characterization by valence electron energy loss spectroscopy
Keywords: اما; EELS; TEM; NiSi;
Analysis of thin high-k and silicide films by means of heavy ion time-of-flight forward-scattering spectrometry
Keywords: اما; 29.30.âh; 81.05.Je; 81.70.Jb; 82.80.Yc; TOF-FS; RBS; ERDA; NiSi; High-k;
Investigation of high-K gate stacks with epitaxial Gd2O3 and FUSI NiSi metal gates down to CET=0.86 nm
Keywords: اما; High-k; Epitaxial dielectric; Gd2O3; Metal gate; Fully silicided (FUSI); NiSi; TiN
Tuning nickel silicide properties using a lamp based RTA, a heat conduction based RTA or a furnace anneal
Keywords: اما; Nickel silicide; NiSi; RTA
Phase effects and short gate length device implementation of Ni fully silicided (FUSI) gates
Keywords: اما; FUSI gates; NiSi; Ni-rich silicides; CMOS
Effect of AlP on the eutectic nucleation in Ni–38 wt.%Si alloys
Keywords: اما; Modification; NiSi2; NiSi; AlP; Nucleation
Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films
Keywords: اما; Nickel silicides; NiSi; Alloying; Agglomeration; NiSi2
45nm LSTP FET with FUSI Gate on PVD-HfO2 with excellent drivability by advanced PDA treatment
Keywords: اما; FUSI; NiSi; PVD; HfO2; Post Deposition Annealing; PDA;
Study of thermal stability of nickel silicide by X-ray reflectivity
Keywords: اما; NiSi; Silicide; XRR; Density;
New salicidation technology PtSi for strained SiGe device
Keywords: اما; Salicidate; Salicidation technology; PtSi; NiSi; Strained SiGe device; Low temperature process; Semiconductor materials;
Silicides as contact material for DRAM applications
Keywords: اما; Contact resistance; DRAM; Leakage; CoSi; NiSi; TiSi;
Nickel silicide formation on shallow junctions
Keywords: اما; 85.40.Ls; 85.40.Ry; 81.05.Je; 82.33.Pt; NiSi; Silicide; Rapid thermal process; Solid state reaction; Dopant redistribution;
Ni fully silicided gates for 45Â nm CMOS applications
Keywords: اما; Ni; Silicide; NiSi2; NiSi; Ni3Si2; Ni2Si; Ni31Si12; Ni3Si; Work function;