Charge trapping and interface states in hydrogen annealed HfO2–Si structures Fulltext Access 4 Pages 2007
Optimization and performance of Al2O3/GaN metal–oxide–semiconductor structures Fulltext Access 4 Pages 2007
High quality gate insulator film formation on SiC using by microwave-excited high-density plasma Fulltext Access 4 Pages 2007
The influence of hydrogen and nitrogen on the formation of Si nanoclusters embedded in sub-stoichiometric silicon oxide layers Fulltext Access 4 Pages 2007
Improved electrical properties using SrTiO3/Y2O3 bilayer dielectrics for MIM capacitor applications Fulltext Access 4 Pages 2007
Development of a permittivity extraction method for ultra low k dielectrics integrated in advanced interconnects Fulltext Access 4 Pages 2007
Development of embedded capacitor with bismuth-based pyrochlore thin films at low temperatures for printed circuit board applications Fulltext Access 4 Pages 2007
Tuneable electrical properties of hafnium aluminate gate dielectrics deposited by metal organic chemical vapour deposition Fulltext Access 4 Pages 2007
Optical characterization of Si-rich silicon nitride films prepared by low pressure chemical vapor deposition Fulltext Access 4 Pages 2007
High-K dielectric deposition in 3D architectures: The case of Ta2O5 deposited with metal–organic precursor TBTDET Fulltext Access 4 Pages 2007
Test structures for dielectric spectroscopy of thin films at microwave frequencies Fulltext Access 4 Pages 2007
Extracting the relative dielectric constant for “high-κ layers” from CV measurements – Errors and error propagation Fulltext Access 4 Pages 2007
Application of an MOS tunnel transistor for measurements of the tunneling parameters and of the parameters of electron energy relaxation in silicon Fulltext Access 4 Pages 2007
Worn-out oxide MOSFET characteristics: Role of gate current and device parameters on a current mirror Fulltext Access 4 Pages 2007
Experimental observations of temperature-dependent flat band voltage transients on high-k dielectrics Fulltext Access 4 Pages 2007
Effective work function of NiSi/HfO2 gate stacks measured with X-ray photoelectron spectroscopy Fulltext Access 4 Pages 2007
The characterization of retention properties of metal–ferroelectric (PbZr0.53Ti0.47O3)–insulator (Dy2O3, Y2O3)–semiconductor devices Fulltext Access 4 Pages 2007
Switching times variation of power MOSFET devices after electrical stress Fulltext Access 4 Pages 2007
Inkjettable conductive adhesive for use in microelectronics and microsystems technology Fulltext Access 4 Pages 2007
Micro-mechanical testing of SiLK by nanoindentation and substrate curvature techniques Fulltext Access 4 Pages 2007
Thermal analysis of InGaN/GaN (GaN substrate) laser diodes using transient interferometric mapping Fulltext Access 4 Pages 2007
Characterization and analysis of trap-related effects in AlGaN–GaN HEMTs Fulltext Access 4 Pages 2007
Study of passivation defects by electroluminescence in AlGaN/GaN HEMTS on SiC Fulltext Access 4 Pages 2007
Stable and robust low-voltage pentacene transistor based on a hybrid dielectric Fulltext Access 4 Pages 2007
Fault localization at high voltage devices using thermally induced voltage alteration (TIVA) Fulltext Access 4 Pages 2007
Active ESD protection circuit design against charged-device-model ESD event in CMOS integrated circuits Fulltext Access 4 Pages 2007
Investigation of low temperature SRAM and ROM failures to enable the replacement of cold test insertion by room temperature test Fulltext Access 4 Pages 2007
Importance of multi-temp testing in automotive qualification and zero defects program Fulltext Access 4 Pages 2007
Lifetime estimation of analog circuits from the electrical characteristics of stressed MOSFETs Fulltext Access 4 Pages 2007
Correlation between infrared transmission spectra and the interface trap density of SiO2 films Fulltext Access 4 Pages 2007
Ferroelectric characteristic of group IV elements added SrBi2Ta2O9 thin films Fulltext Access 4 Pages 2007
Measurement of the hot carrier damage profile in LDMOS devices stressed at high drain voltage Fulltext Access 4 Pages 2007
Carrier trapping in thin N2O-grown oxynitride/oxide di-layer for PowerMOSFET devices Fulltext Access 4 Pages 2007
Low-leakage MIS structures with 1.5-6 nm CaF2 insulating layer on Si(1 1 1) Fulltext Access 4 Pages 2007
Fabrication of Ge2Sb2Te5 based PRAM device at 60 nm scale by using UV nanoimprint lithography Fulltext Access 4 Pages 2007
Scanning spreading resistance microscopy of defect engineered low dose SIMOX samples Fulltext Access 4 Pages 2007
Applications of quantitative image analysis to the description of the morphology of ZrO2 including 10% Eu3+ and their polyurethane nanocomposites Fulltext Access 4 Pages 2007
Preparation of defined structures on very thin foils for characterization of AFM probes Fulltext Access 4 Pages 2007
Markers prepared by focus ion beam technique for nanopositioning procedures Fulltext Access 4 Pages 2007
Quantitative electron energy loss spectroscopy of Si nanoclusters embedded in SiOx Fulltext Access 4 Pages 2007
Convergent beam electron diffraction for strain determination at the nanoscale Fulltext Access 4 Pages 2007
Mapping stress and strain in nanostructures by high-resolution transmission electron microscopy Fulltext Access 4 Pages 2007
High spatial and energy resolution characterization of lateral inhomogeneous Schottky barriers by conductive atomic force microscopy Fulltext Access 4 Pages 2007
Carrier concentration and mobility profiling in quantum wells by scanning probe microscopy Fulltext Access 4 Pages 2007
Evaluation of the junction delineation accuracy and reproducibility with the SSRM technique Fulltext Access 4 Pages 2007
Development of robust interfaces based on crystalline γ-Al2O3(001) for subsequent deposition of amorphous high-κ oxides Fulltext Access 4 Pages 2007
Electrical characterization of directly deposited La-Sc oxides complex for gate insulator application Fulltext Access 4 Pages 2007
Enhancement in thermal stability of atomic layer deposited HfO2 films by using top Hf metal layer Fulltext Access 4 Pages 2007
Integration of functional epitaxial oxides into silicon: from high-k application to nanostructures Fulltext Access 4 Pages 2007
Forming gas anneal induced flat-band voltage shift of metal-oxide-semiconductor stacks and its link with hydrogen incorporation in metal gates Fulltext Access 4 Pages 2007
Application of combinatorial methodologies for work function engineering of metal gate/high-κ advanced gate stacks Fulltext Access 4 Pages 2007
Band-edge metal gate materials for atomic-layer-deposited HfO2 for future CMOS technology Fulltext Access 4 Pages 2007
Improved electrical characteristics of high-k gated MOS devices by nitrogen incorporation with plasma immersion ion implantation (PIII) Fulltext Access 4 Pages 2007
Integration of gas cluster process for copper interconnects reliability improvement and process impact evaluation on BEOL dielectric materials Fulltext Access 4 Pages 2007
Hydrogen desorption and diffusion in PECVD silicon nitride. Application to passivation of CMOS active pixel sensors Fulltext Access 4 Pages 2007
An investigation of surface state capture cross-sections for metal–oxide–semiconductor field-effect transistors using HfO2 gate dielectrics Fulltext Access 4 Pages 2007
Electrical characterization of metal-oxide-high-k dielectric-oxide-semiconductor (MOHOS) structures for memory applications Fulltext Access 4 Pages 2007
Ionising radiation and electrical stress on nanocrystal memory cell array Fulltext Access 4 Pages 2007
Random telegraph signal: A sensitive and nondestructive tool for gate oxide single trap characterization Fulltext Access 4 Pages 2007
Influence of the SiO2 layer thickness on the degradation of HfO2/SiO2 stacks subjected to static and dynamic stress conditions Fulltext Access 4 Pages 2007
Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO2 and ZrO2 high-κ dielectrics Fulltext Access 4 Pages 2007
Post deposition annealing studies of lanthanum aluminate and ceria high-k dielectrics on germanium Fulltext Access 4 Pages 2007
Electrical characterization of crystalline Gd2O3 gate dielectric MOSFETs fabricated by damascene metal gate technology Fulltext Access 4 Pages 2007
Optimization of HfSiON using a design of experiment (DOE) approach on 0.45 V Vt Ni-FUSI CMOS transistors Fulltext Access 4 Pages 2007
Interfacial layer quality effects on low-frequency noise (1/f) in p-MOSFETs with advanced gate stacks Fulltext Access 4 Pages 2007
Reliability aspects of Hf-based capacitors: Breakdown and trapping effects Fulltext Access 4 Pages 2007
Optical image formation using surface relief micrographic picture elements Fulltext Access 4 Pages 2007
Reliability screening of high-k dielectrics based on voltage ramp stress Fulltext Access 5 Pages 2007
Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed C–V technique Fulltext Access 5 Pages 2007
Defects induced anomalous breakdown kinetics in Pr2O3 by micro- and nano-characterization Fulltext Access 5 Pages 2007
Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors Fulltext Access 5 Pages 2007
Charge accumulation in the dielectric of the nanocluster NVM MOS structures under anti- and unipolar W/E window formation Fulltext Access 5 Pages 2007