
Investigation of an ion-milled Si/Cr multilayer using micro-RBS, ellipsometry and AES depth profiling techniques
Keywords: الیپسومتری; 68.65.Ac; 79.20.Rf; 82.80.Pv; 82.80.Yc; 07.60.FsMultilayer; Ion beam milling; Ellipsometry; AES; Depth profiling; RBS; Tomography